本研究利用脈衝雷射濺鍍沉積(Pulsed-laser deposition method, PLD)製備 氧化鐵奈米柱陣列薄膜於FTO 導電玻璃上，再利用熱處理法以進行晶體結 構之強化，並探討以脈衝雷射濺鍍沉積製備氧化鐵機制以及熱處理各項參 數的改變對氧化鐵薄膜物理特性及光電化學性質的影響。 以X-ray 繞射分析儀檢測，氧化鐵薄膜經由PLD 與熱處理之晶體結構 變化，發現PLD 之雷射通量100 J/cm2 有優選[110]。以掃描式電子顯微鏡觀 察沉積之奈米柱結構的表面型態及側面的柱狀結構，則PLD 之氧壓16 Pa~29 Pa 有奈米柱陣列的產生。以紫外光/可見光/近紅外光光譜儀檢測不同 奈米柱陣列對光吸收性之影響，則奈米柱內部之氧化鐵顆粒由圓形到長條 形的階段，光吸收率會逐漸上升。在光電化學量測上，以1 M 的KOH 水溶 液為電解液，由Mott-Schottky 分析得知隨著熱處理之氧壓下降，其載子濃 度越高，有利於電化學反應的產生；以AM 1.5 太陽光模擬器，氧化鐵薄膜 相對於參考電極Ag/AgCl 之偏壓0 V 時，最佳的光電流密度值為0.13 mA/cm2。;Pulsed laser deposition (PLD) was used to prepare α-Fe2O3 nanorod array thin film on FTO glass, followed by annealing to improve crystal structure. Effects of PLD parameters and annealing parameters on the physical properties and photoelectrochemical properties of α-Fe2O3 film are also investigated. By comparing crystal structures using XRD analysis for different PLD and annealing parameters, we found PLD fluence of 100 J/cm2 resulted in crystals with [110] preference. Using SEM to observe the surface and cross-sectional morphology of α-Fe2O3 nanorod, we found PLD oxygen pressure of 16 Pa to 29 Pa successfully grow nanorod array thin film. In addition, we found that the absorption coefficient increases when the gran shape of α-Fe2O3 changes from spherical to ellipsoidal. From Mott-Schottky analysis, carrier density is found to increase as the oxygen pressure in annealing process decreases. Under AM 1.5 solar irradiation, the photocurrent density is found to be 0.13 mA/cm2 with zero applied potential vs. Ag/AgCl.
