Microstructure- and composition-related characteristics of LaF3 thin films at 193 nm

NCUIR > Research Center > Thin Film Technology Center > journal & Dissertation > Item 987654321/35676

Please use this identifier to cite or link to this item: http://ir.lib.ncu.edu.tw/handle/987654321/35676

Title:	Microstructure- and composition-related characteristics of LaF3 thin films at 193 nm
Authors:	Liu,Ming-Chung;Lee,Cheng-Chung;Kaneko,Masaaki;Nakahira,Kazuhide;Takano,Yuuichi
Contributors:	薄膜技術研究中心
Keywords:	VACUUM ULTRAVIOLET;COATING MATERIALS;OPTICAL COATINGS;FLUORIDE FILMS;MGF2;EVAPORATION;DEPOSITION;BOAT
Date:	2006
Issue Date:	2010-07-07 15:47:42 (UTC+8)
Publisher:	中央大學
Abstract:	The characteristics of lanthanum fluoride (LaF3) thin films deposited with a resistive heating (RH) boat and by e-beam gun evaporation at different substrate temperatures have been studied. The characteristics of the deposited films, including optical pro
Relation:	OPTICAL ENGINEERING
Appears in Collections:	[Thin Film Technology Center] journal & Dissertation

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